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Etching Gas Plasma Etching High Purity 99.999% C4f8 Gas 5n Octafluorocyclobutane Gas pictures & photos
Etching Gas Plasma Etching High Purity 99.999% C4f8 Gas 5n Octafluorocyclobutane Gas pictures & photos
Etching Gas Plasma Etching High Purity 99.999% C4f8 Gas 5n Octafluorocyclobutane Gas pictures & photos
Etching Gas Plasma Etching High Purity 99.999% C4f8 Gas 5n Octafluorocyclobutane Gas pictures & photos
Etching Gas Plasma Etching High Purity 99.999% C4f8 Gas 5n Octafluorocyclobutane Gas pictures & photos
Etching Gas Plasma Etching High Purity 99.999% C4f8 Gas 5n Octafluorocyclobutane Gas pictures & photos
  • Etching Gas Plasma Etching High Purity 99.999% C4f8 Gas 5n Octafluorocyclobutane Gas
  • Etching Gas Plasma Etching High Purity 99.999% C4f8 Gas 5n Octafluorocyclobutane Gas
  • Etching Gas Plasma Etching High Purity 99.999% C4f8 Gas 5n Octafluorocyclobutane Gas
  • Etching Gas Plasma Etching High Purity 99.999% C4f8 Gas 5n Octafluorocyclobutane Gas
  • Etching Gas Plasma Etching High Purity 99.999% C4f8 Gas 5n Octafluorocyclobutane Gas
  • Etching Gas Plasma Etching High Purity 99.999% C4f8 Gas 5n Octafluorocyclobutane Gas
CAS No.: 115-25-3
Formula: C4f8
EINECS: 204-075-2
Constituent: Industrial Pure Air
Grade Standard: Electronic Grade
Chemical Property: Non-Flammable Gas

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